Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (29권5호 482-486)

APPLICATIONS OF SOI DEVICE TECHNOLOGY


Ryoo, Kunkul;


Materials Surface Research Team;

Abstract

The progress of microelectronics technology has been requiring agressive developments of device technologies. Also the requirements of the next generation devices is heading to the limits of their functions and materials, and hence asking the very specific silicon wafer such as SOI(Silicon On Insulator) wafer. The talk covers the dome stic and world-wide status of SOI device developments and applications. The presentation will also touch some predictions such as SOI device prgress schedules, impacts on the normal wafer developments, market sizes, SOI wafer prices, and so on. Finally it will cover technical aspects which are silicon oxide conditions for bonding, point defects and, surface contaminations. These points will be hopefully overcome by involved people in microelectronics industry.

Keywords