Atmospheric Pressure Plasma Research Activity in Korea
[Uhm, Han S.;]
Department of Molecular Science & Technology, Ajou University;
한국표면공학회지, Vol. 34, No. 5, pp. 367-377.
DOI :
Perspective of industrial application of high pressure and low temperature plasma
[Kogoma, Masuhiro;Tanaka, Kunihito;]
Faculty of Science and Technology, Department of Chemistry;
한국표면공학회지, Vol. 34, No. 5, pp. 378-383.
DOI :
Atmospheric Pressure Micro Plasma Sources
[Brown, Ian;]
Lawrence Berkeley National Laboratory Berkeley;
한국표면공학회지, Vol. 34, No. 5, pp. 384-390.
DOI :
The atmospheric plasma reactor with water wall to decompose CF4
[Itatani, Ryohei;Deguchi, Mikio;Toda, Toshihiko;Ban, Heitaro;]
Niihama National College of Technology;Youth Engineering Co., LTD.;
한국표면공학회지, Vol. 34, No. 5, pp. 391-394.
DOI :
Recent Advance in High Pressure Induction Plasma Source
[Sakuta, T.;]
Department of Electrical and Computer Engineering Kanazawa University;
한국표면공학회지, Vol. 34, No. 5, pp. 395-402.
DOI :
[Kim, K.J.;C.H. Oh;Lee, N.E.;Kim, J.H.;J.W. Bae;G.Y. Yeom;S.S. Yoon;]
Dept. of Materials Engineering, Sungkyunkwan University;Dept. of Materials Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 403-408.
DOI :
High rate magnetron sputtering of thick Cr-based tribological coatings
[Bin, Jin H.;Nam, Kyung H.;Boo, Jin H.;Han, Jeon G.;]
Center for Advanced Plasma Surface Technology, SungKyunKwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 409-413.
DOI :
Hard TiN Coating by Magnetron-ICP P
[S.A. Nikiforov;Kim, G.H.;G.H. Rim;K.W. Urm;Lee, S.H.;]
Korea Electrotechnology Research Institute (KERI);Doosan Heavy Industries & Construction Co.;
한국표면공학회지, Vol. 34, No. 5, pp. 414-420.
DOI :
Synthesis of WC-CrN superlattice film by cathodic arc ion plating system
[Lee, Ho.Y.;Jeon.G. Han;Se.H. Yang;]
Center for Advanced Plasma Surface Technology SungKyunKwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 421-428.
DOI :
[Hyun S. Myung;Lee, Hyuk M.;Jeon G. Han;]
Center for Advanced Plasma Surface Technology(CAPST), Sungkyunkwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 429-434.
DOI :
[S.H. Ahn;J.H. Yoo;Kim, J.G.;Lee, H.Y.;J.G. Han;]
Center for Advanced Plasma Surface Technology(CAPST), SungKyunKwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 435-444.
DOI :
Characterization of oxide scales formed on TiCrN coatings
[Kim, Gi-Young;Lee, Dong-Bok;]
Center for Advanced Plasma Surface Technology, Sungkyunkwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 445-447.
DOI :
[Satyanarayana, B.S.;Hiraki, A.;]
KUT Academic & Industrial Collaboration Centre, Kochi University of Technology;
한국표면공학회지, Vol. 34, No. 5, pp. 448-454.
DOI :
[Shaginyan, L.R.;]
Institute for Materials Science Problems of National Academy of Sciences of Ukraine;
한국표면공학회지, Vol. 34, No. 5, pp. 455-464.
DOI :
[Yoo, Ji-Hong;Ahn, Seung-Ho;Kim, Jung-Gu;Lee, Sang-Yul;]
Department of Advanced Materials Engineering, Sungkyunkwan University;Department of Materials Engineering, Hankuk Aviation University;
한국표면공학회지, Vol. 34, No. 5, pp. 465-474.
DOI :
[Kim, K.J.;Kim, K.S.;Y.C. Jang;Lee, N.E.;Park, J.;D. Jung;]
Department of Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University;Department of Physics, Sungkyunkwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 475-480.
DOI :
Preparation and Characterization of Barium Zirconate Titanate Thin Films
[Park, Won-Seok;Jang, Bum-Sik;Yonghan Roh;Junsin Yi;Byungyou Hong;]
Electrical and Computer Engineering, Sungkyunkwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 481-485.
DOI :
[Park, Han-Shin;Kim, Hyung-Jun;Lee, Chang-Hee;]
Division of Material Science and Engineering, Hanyang University;RIST, Welding & Structural Integrity Research Team;
한국표면공학회지, Vol. 34, No. 5, pp. 486-493.
DOI :
Tunnel i unction-Mangnetorsistance in Co-Al-O
[Jeon, Dong-Min;Park, Jin-Woo;Suh, Su-Jeong;]
Depart. of Advanced Materials. Engin., Sungkyunkwan Univ.;
한국표면공학회지, Vol. 34, No. 5, pp. 494-498.
DOI :
The Oxidation of Functionally Gradient NiCrAlY/YSZ Coatings
[Park, K.B.;Park, H.S.;Kim, H.J.;Lee, D.B.;]
Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Division of Materials Science and Engineering, Hanyang University;Center for Advanced Plasma Surface Technology, RIST;
한국표면공학회지, Vol. 34, No. 5, pp. 499-502.
DOI :
Growth and Characterization of a-Si :H and a-SiC:H Thin Films Grown by RF-PECVD
[Kim, Y.T.;S.J. Suh;D.H. Yoon;Park, M.G.;Park, W.S.;Kim, M.C.;J.H. Boo;B. Hong;G.E. Jang;]
School of Metallurgical & Materials Engineering, Sungkyunkwan University;Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Department of Materials Science & Engineering, Chungbuk University;
한국표면공학회지, Vol. 34, No. 5, pp. 503-509.
DOI :
[G.C. Chen;D.C. Lim;Lee, S.B.;B.Y. Hong;Kim, Y.J.;J.H. Boo;]
Center for Advanced Plasma Surface Technology, SungKyunKwan University;
한국표면공학회지, Vol. 34, No. 5, pp. 510-515.
DOI :
The Development of Cl-Plasma Etching Procedure for Si and SiO
[Kim, Jong-Woo;Jung, Mi-Young;Park, Sung-Soo;Boo, Jin-Hyo;]
Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Department of Physics, Sunmoon University;
한국표면공학회지, Vol. 34, No. 5, pp. 516-521.
DOI :