저널

A study of WSi$_2$ film peeling off from Si substrate
텅스텐 실리사이드 박막 들뜸에 관한 연구

한성호;이재갑;김창수;이은구;

국민대학교 금속재료공학과;한국 표준과학 연구원;조선대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 1, pp. 3-14.

DOI :

Wear Behaviors of Plasma-Sprayed Coating Layers in Mo and Co-based Alloy
몰리브덴늄 및 코발트 합금을 플라즈마 용사한 피막 층의 마모거동

[S. W., Lee;B. K., Kim;G. H., Ha;T. H., Nam;]

Dept. of materials Engineering, Sun Moon University;Material Foaming Lab., KIMM;Dept of Metallurgical Engineering, Gyeong Sang National University;

한국표면공학회지, Vol. 29, No. 1, pp. 15-25.

DOI :

A study on the wear resistance of Ni-SiC composite plating
Ni-SiC 복합도금층의 내마모성에 관한 연구

김성호;한혜원;장현구;

성균관대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 1, pp. 26-35.

DOI :

The Effect of Rapid Solidification Process on the Oxidation Behavior of Fe-Cr-Al Alloys at Elevated Temperature
Fe-Cr-Al 합금의 급속응고가 고온산화거동에 미치는 영향

문병기;김재철;김길무;

한국기계연구원 재료공정과;한국전력연구원;충남대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 1, pp. 36-44.

DOI :

Synthesis of Ultrafine Powders for Aluminum Nitride by DC Thermal Plasma
직류 열플라즈마를 이용한 질화알루미늄 초미세분말의 합성

안현;허민;홍상희;

서울대학교 원자핵공학과;

한국표면공학회지, Vol. 29, No. 1, pp. 45-59.

DOI :

The Fabrication of Digitron Grid by Photoetching Process
포토에칭법에 의한 Digitron용 Grid제조에 관한 연구

김만;이종권;

한국기계연구원 재료공정부;순천향대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 1, pp. 60-72.

DOI :

A Study on Plasma Sprayed Porous Super Austenitic Stainless Steel Coating for Improvement of Bone Ingrowth
Bone ingrowth 향상을 위해 플라즈마 용사된 초내식성 오스테나이트 스테인리스강의 다공성 코팅층에 대한 연구

오근택;박용수;

연세대학교 금속공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 81-92.

DOI :

The Effect of Substrate Bias Voltage during the Formation of BN film by R. F. Sputtering Method
RF 스퍼터링법에 의한 BN박막 증착시 기판 바이어스전압의 영향에 관한 연구

이은국;김도훈;

연세대학교 공과대학 금속공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 93-99.

DOI :

The Change in Residual Stress of Electroless Nickel Deposits on Aluminum Substrate
Al 소지상에 무전해 Ni도금시 응력 변화

권진수;최순돈;

LG통신 오산연구소 개발실;영남대학교 금속공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 100-108.

DOI :

The Effects of Stabilizers on Adhesion of Electroless Copper Deposits on Alumina
Alumina 소지상의 무전해 동도금층의 밀착력에 미치는 안정제의 영향

최순돈;이희록;

영남대학교 금속공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 109-119.

DOI :

The Aluminizing of Boronized Low Carbon Steel
침붕처리한 저탄소강의 알루미늄 확산처리에 관한 연구

윤영식;김한삼;김수식;

인하대학교 공과대학 금속공학과;인하공업전문대학 금속과;

한국표면공학회지, Vol. 29, No. 2, pp. 120-131.

DOI :

Improvement of the Degreasing Performance of Surface Treating Steel Sheet by the Automatic Control of Alkaline Degreasing Process
알칼리탈지공정 자동화관리에 의한 표면처리용 강판의 탈지능 향상

박노범;박대수;박정렬;유민수;

POSCO 기술연구소 광양압연연구팀;전남대학교 화학공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 132-139.

DOI :

A Study on the Feasibility of a Cyanide-Free Silver Plating Bath
비시안 은도금욕의 가능성에 관한 연구

이상화;

동아대학교 금속공학과;

한국표면공학회지, Vol. 29, No. 2, pp. 140-145.

DOI :

Synthesis of Conducting Diamond-Like Carbon Films by Triode Magnetron Sputtering-Chemical Vapor Deposition
3극 마그네트론 스팟터링 화학 기상 증착법에 의한 도전성 다이아몬드성 탄소 박막의 합성

태흥식;황기웅;

경북대학교 전자전기 공학부;서울대학교 전기공학부;

한국표면공학회지, Vol. 29, No. 3, pp. 149-156.

DOI :

The effects of Cu thin films sputter deposited at 5 and 100 mtorr on the adhesion between Cu/Cr film and polyimide
5, 100 mtorr의 증착압력에서 스퍼터 증착한 구리박막층이 Cu/Cr 박막과 폴리이미드 사이의 접착력에 미치는 영향

조철호;김영호;

한양대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 3, pp. 157-162.

DOI :

Microstructure and Thermal Fatigue Properties of Flame-Sprayed Nickel-Based Coatings
니켈계 용사층의 조직 및 열피로 특성

김형준;권영각;

포항산업과학연구원, 설비기술연구팀;

한국표면공학회지, Vol. 29, No. 3, pp. 163-175.

DOI :

The Effect of the Phase Transformations on the Durability of the Plasma Sprayed Thermal Barrier Coatings
플라즈마 용사에 의한 열벽코팅의 상변태가 내구성에 미치는 영향

[E. Y., Lee;]

Dept. of Materials Science and Engineering Andong National University;

한국표면공학회지, Vol. 29, No. 3, pp. 176-185.

DOI :

Adhesion characteristics of copper layer fabricated by Sol-Gel process
Sol-Gel법을 이용한 알루미나 기판과 동 피복층간의 접착력 특성

김동규;이홍로;

충남대학교 공과대학 금속공학과;

한국표면공학회지, Vol. 29, No. 3, pp. 186-194.

DOI :

Composition and Coercivity of Fe-Co-Ni Alloy Electrodeposits
Fe-Co-Ni합금박막의 조성 및 자기적 성질

예길촌;김용웅;문근호;

영남대학교 금속공학과;

한국표면공학회지, Vol. 29, No. 3, pp. 195-202.

DOI :

Behavior of Surface Oxide on the Cold Rolled Steel Sheet and its Phosphatability
강판의 산화막 거동 및 인산염처리성의 평가

김형준;
[Kim, H. J.;]

포항제철(주)기술연구소 표면처리연구팀;
POSCO;

한국표면공학회지, Vol. 29, No. 3, pp. 203-210.

DOI :

Electrodeposition behaviors of zinc from neutral chloride baths at high current density
중성염화물욕에서 아연의 고전류밀도 전착특성

김영근;

포항종합제철(주) 기술연구소 광양압연연구팀;

한국표면공학회지, Vol. 29, No. 4, pp. 219-228.

DOI :

Manufacture of Thin Polymer Matrix for PAFC
인산형 연료전지용 고분자 박막 매트릭스 제조

심재철;은영찬;신동열;이주성;

한양대학교 공과대학 공업화학과;한국에너지 기술연구소;

한국표면공학회지, Vol. 29, No. 4, pp. 229-237.

DOI :

Peel Strength Analyses of Copper/Epoxy System
구리/에폭시 계의 필 접착력 분석

최광성;유진;이호영;

한국과학기술원 재료공학과;

한국표면공학회지, Vol. 29, No. 4, pp. 238-252.

DOI :

A Study on the Developmentment of Zero-spangle Hot Dip Galvanized Steel Sheets with High Brightness and Corrosion Resistance
고광택 고내식 용융아연도금 제로스팡글 개발에 관한 연구

진영구;김흥윤;

포항제철(주) 기술연구소 광양압연연구팀;

한국표면공학회지, Vol. 29, No. 4, pp. 253-260.

DOI :

The effect of deposition conditions on the adhesion strength of TiN multilayer by D. C. magnetron sputtering
D. C. 마그네트론 스퍼터링에 의한 증착조건이 TiN다층박막의 밀착력에 미치는 영향

김선규;유정광;이건환;권식철;

울산대학교 공과대학 금속공학과;대우전자제2연구소;한국기계연구원 박막연구실;

한국표면공학회지, Vol. 29, No. 4, pp. 261-267.

DOI :

A Study on the Boronizing treatment of the microalloyed steel
비조질강의 Boronizing 처리에 관한 연구

김강형;선명숙;윤재홍;변응선;권동일;

창원대학교 공과대학 재료공학과;한국기계연구원;서울대학교 공과대학 재료공학부;

한국표면공학회지, Vol. 29, No. 4, pp. 268-277.

DOI :

Microstructure and Hardness of Al-Cu Alloy Coating on Monel 400 by Hot Dipping
액상 침적에 의한 Monel 400기지상에 형성된 Al-Cu 합금 코팅층의 조직 및 경도

조선욱;이임렬;

단국대학교 재료공학과;

한국표면공학회지, Vol. 29, No. 4, pp. 278-285.

DOI :

TEXTURE AND RELATED MICROSTRUCTURE AND SURF ACE TOPOGRAPHY OF VAPOR DEPOSITS

[Lee, Dong-Nyung;]

School of Materials Science and Engineering Seoul National University;

한국표면공학회지, Vol. 29, No. 5, pp. 301-313.

DOI :

SCANNING PROBE NANOPROCESSING

[Sugimura, Hiroyuki;Nakagiri, Nobuyuki;]

Tsukuba Research Laboratory, Nikon Corporation;

한국표면공학회지, Vol. 29, No. 5, pp. 314-324.

DOI :

MOVPE GROWTH OF HgCdTe EPILAYER WITH ARSENIC DOPING

[Suh, Sang-Hee;Kim, Jin-Sang;Song, Jong-Hyeong;Kim, Je-Won;]

Korea Institute of Science and Technology;Korea University;

한국표면공학회지, Vol. 29, No. 5, pp. 325-329.

DOI :

PROPOSE NEW MIXTURE TARGET FOR LOW-TEMPERATURE AND HIGH- RATE DEPOSITION OF PZT THIN FILMS BY REACTIVE SPUTTERING

[Hata, Tomonobu;Zhang, WeiXiao;Sasaki, Kimihiro;]

Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University;

한국표면공학회지, Vol. 29, No. 5, pp. 330-337.

DOI :

COMPARISON OF PLASMA-INDUCED SURFACE DAMAGES IN VARIOUS PLASMA SOURCES

[Yi, Dong-Hyen;Lee, Jun-Sik;Kim, Sang-Kyun;Kim, Jae-Jeong;]

Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;

한국표면공학회지, Vol. 29, No. 5, pp. 338-344.

DOI :

POLYMER SURFACE MODIFICATION WITH PLASMA SOURCE ION IMPLANTATION TECHNIQUE

[Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;Kim, Hai-Dong;Kim, Gon-ho;Kim, GunWoo;]

Advanced Analysis Center, Korea Institute of Science and Technology;Department of Chemistry, Kyunghee University;Department of Physics, Hanyang University;

한국표면공학회지, Vol. 29, No. 5, pp. 345-349.

DOI :

VHF-PECVD OF Ti/TiN WITH SILANE REDUCTION PROCESS

[Mizuno, Shigeru;]

ANELVA Corpotation, Yotsuya;

한국표면공학회지, Vol. 29, No. 5, pp. 350-356.

DOI :

APPLICATION OF RADIO-FREQUENCY (RF) THERMAL PLASMA TO FILM FORMATION

[Terashima, Kazuo;Yoshida, Toyonobu;]

The University of Tokyo, Graduate School of Engineering, Department of Metallurgy and Materials Science;

한국표면공학회지, Vol. 29, No. 5, pp. 357-362.

DOI :

SYNTHESIS OF CARBON NITRIDE THIN FILMS BY PLASMA PROCESSING

[Takai, Osamu;Taki, Yusuke;Kitagawa, Toshihisa;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 363-370.

DOI :

NEW APPLICATIONS OF R.F. PLASMA TO MATERIALS PROCESSING

[Akashi, Kazuo;Ito, Shigru;]

Science University of Tokyo;

한국표면공학회지, Vol. 29, No. 5, pp. 371-378.

DOI :

THIN FILM ADHESION IN Cu/Cr/POLYIMIDE AND Cu/Cu-Cr/POLYIMIDE SYSTEMS

[Joh, Cheol-Ho;Kim, Young-Ho;Oh, Tae-Sung;Park, Ik-Sung;Yu, Jin;]

Dept. of Materials Engineering, Hanyang University;Dept. of Metall. and Mater. Sci., Hongik University;Dept. of Mater. Sci. and Eng., KAIST;

한국표면공학회지, Vol. 29, No. 5, pp. 379-385.

DOI :

MAGNETORESISTANCE OF EPITAXIALLY GROWN METALLIC MULTILAYERS

[Kamada, Yasuhiro;Saza, Yasuyuki;Matsui, Masaaki;]

Department of Materials Science and Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 386-392.

DOI :

SOFT MAGNETIC PROPERTIES OF FeTaNC NANOCRYSTALLINE FILMS

[Koh, Tae-Hyuk;Shin, Dong-Hoon;Choi, Woon;Ahn, Dong-Hoon;Nam, Seoung-Eui;Kim, Hyoung-June;]

Dept. of Met. & Mater. Sci., Hong-ik Univ.;Mater. Sci., Hong-ik Univ.;Multimedia Lab. LG Electronics;

한국표면공학회지, Vol. 29, No. 5, pp. 393-398.

DOI :

PREFERRED ORIENTATION OF TIN FILM STUDIED BT A REAL TIME SYNCHROTRON X-RAY SCATTERING

[Je, J.H.;Noh, D.Y.;]

Dept. of Matls Sci. & Eng., Pohang University of Science & Technology;Dept. of Matls Sci. & Eng., Kwangju University of Science & Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 399-406.

DOI :

THIN FILM GROWTH AND SURFACE REACTION ON H-TERMINATED SILICON SURFACE

[Yasuda, Yukio;Zaima, Shigeaki;]

Department of Crystalline Materials Science, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 407-414.

DOI :

THIN FILM TECHNOLOGIES RELATED TO THE HIGH T$_{c}$ SUPERCONDUCTORS

[Ri, Eui-Jae;]

Korean Academy of Industrial Technologies;

한국표면공학회지, Vol. 29, No. 5, pp. 415-423.

DOI :

SHAPE MEMORY THIN FILM OF TITANIUM-NICKEL FOR MICROACTUATOR FORMED BY SPUTTERING

[Takei, A.;Ishida, A.;]

National Research Institute for Metals;

한국표면공학회지, Vol. 29, No. 5, pp. 424-429.

DOI :

HIGH TEMPERATURE SUPERCONDUCTING THIN FILMS PREP ARED BY PULSED LASER DEPOSITION

[Park, Yong-Ki;Kim, In-Seon;Ha, Dong-Han;Hwang, Doo-Sup;Huh, Yun-Sung;Park, Jong-Chul;]

Korea Research Institute of Standards and Science;Samsung Electronics Co. Ltd, Semiconductor R ＆ D Center;Samsung Electronics Co. Ltd.;

한국표면공학회지, Vol. 29, No. 5, pp. 430-436.

DOI :

FABRICATION OF HIGH QUALITY YBa$_2$Cu$_3$O$_{y}$ THIN FILMS USING PULSED LASER DEPOSITION

[Lee, Eun-Hong;Park, Sang-Jin;Song, I-Hun;Song, In-Sang;Gohng, Jun-Ho;Sok, Jung-Hyun;Lee, Jo-Won;]

Electronic Materials Lab., Materials Sector, Samsung Advanced Institute of Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 437-442.

DOI :

PLASMA-SULFNITRIDING USING HOLLOW CATHODE DISCHARGE

[Urao, Ryoichi;Hong, Sung-pill;]

Materials Science, School of Engineering, Ibaraki University;Graduate School, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 443-448.

DOI :

INFLUENCE OF ANTHRECENE DOPING ON ELECTRICAL AND LIGHT-EMITTING BEHAYIOR OF 8-HYDROXYQUINOLINE-ALUMINUM BESED ELECTROLUMINESCENT DEVICES

[Kinoshita, Osamu;Yamaguchi, Ryuichi;Masui, Masayoshi;Takeuchi, Manabu;]

Department of Electrical and Electronic Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 449-453.

DOI :

THERMAL PROPERTIES OF SIC/C FUNCTIONALLY GRADIENT MATERIALS BY CVD

[Kim, Yoo-Taek;Auh, Keun-Ho;]

Department of Materials Science and Engineering, Kyonggi University;Depatment of Ceramic Engineering, Hanyang University;

한국표면공학회지, Vol. 29, No. 5, pp. 454-458.

DOI :

THIN FILM SENSORS FOR AUTOMOBILE

[Taga, Yasunori;]

TOYOTA Central Research and Development Laboratories.;

한국표면공학회지, Vol. 29, No. 5, pp. 459-466.

DOI :

USE OF SINGLE PRECURORS FOR THE PREP ARATION OF SILICON CARBIDE FILMS

[Lee, Kyunf-Won;Yu, Kyu-Sang;Kim, Yun-Soo;]

Korea Research Institute of Chemical. Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 467-473.

DOI :

SOLID STATE CESIUM ION BEAM SPUTTER DEPOSITION

[Baik, Bong-Koo;Choi, Dong-Jun;Han, Dong-Won;Kim, Yong-Hwan;Kim, Seong-In;]

Department of Metallurgical Engineering, Yonsei University;SKION Corporation;

한국표면공학회지, Vol. 29, No. 5, pp. 474-477.

DOI :

APPLICATION OF DISPROPORTIONATION REACTION TO SURFACE TREATMENT

[Oki, Takeo;]

Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 478-481.

DOI :

APPLICATIONS OF SOI DEVICE TECHNOLOGY

[Ryoo, Kunkul;]

Materials Surface Research Team;

한국표면공학회지, Vol. 29, No. 5, pp. 482-486.

DOI :

LOW TEMPERATURE DIAMOND GROWTH USING MICROWAVE PLASMA CVD

[Sakamoto, Yukihiro;Takaya, Matsufumi;Shinohara, Kibatsu;]

Chiba Institute of Technology;Nihon Koshuha, CO., Ltd;

한국표면공학회지, Vol. 29, No. 5, pp. 487-493.

DOI :

EFFECTS OF NITROGEN AND CARBON ION IMPLANTATION INTO AUSTENITIC STAINLESS STEEL ON HYDROGEN ABSORPTION

[Terashima, K.;Minegishi, T.;Matsusaka, K.;]

Chiba Inst. of Tech.;Shibaura Inst. of Tech.;

한국표면공학회지, Vol. 29, No. 5, pp. 494-497.

DOI :

SPUTTER-DEPOSITION OF CARBON NITRIDE FILMS WITH HIGH NITROGEN CONCENTRATION

[Taki, Yusuke;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 498-504.

DOI :

FIELD EMISSION CHARACTERISTICS OF DIAMOND FILMS

[Park, Kyung-Ho;Lee, Soon-Il;Koh, Ken-Ha;Park, Jung-Il;Park, Kwang-Ja;]

Department of Physics, Ajou University;Inorganic Chemistry Department, National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 5, pp. 505-511.

DOI :

STRUCTURE AND MACHANICAL PROPERTIES OF a-C:N MULTILAYER FILMS PREPARED BY ARC ION PLATING

[Kitagawa, Toshihisa;Taki, Yusuke;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 512-518.

DOI :

XPS STUDY ON SN-DOPED DLC FILMS PREPARED BY RF PLASMA-ENHANCED CVD

[Inoue, Y.;Komoguchi, T.;Nakata, H.;Takai, O.;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 519-524.

DOI :

CRYSTALLINE PHASES AND HARDNESS OF (Ti$_{1-x}$Al$_{x}$)N COATINGS DEPOSITED BY REACTIVE SPUTTERING

[Park, Chong-Kwan;Park, Joo-Dong;Oh, Tae-Sung;]

Department of Metallurgy and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 29, No. 5, pp. 525-531.

DOI :

SPECTRO-ELLIPSOMETRIC STUDIES OF STRUCTURE AND OPTICAL PROPERTIES OF PLSMA-GROWN DLC FILMS

[Rhee, Sung-Gyu;Lee, Soon-Il;Oh, Soo-Ghee;Lee, Kwang-Ryeol;]

Department of physics Ajou University;Division of Ceramics, Korea Institute of Science and Technnology;

한국표면공학회지, Vol. 29, No. 5, pp. 532-539.

DOI :

ADHESION STRENGTH OF DIAMOND COATED WC-Co TOOLS USING MICROWAVE PLASMA CVD

[Kiyama, Nobumichi;Sakamoto, Yukihiro;Takaya, Matsufumi;]

Chiba Institute of Technology, Graduate School;Chiba Institute of Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 540-544.

DOI :

A STUDY ON WEAR AND CORROSION RESISTANCE OF CrN$_{x}$ FILMS BY CATHODIC ARC ION PLATING PROCESS

[Han, Jeon-G.;Kim, Hyung-J.;Kim, Sang-S.;]

Plasm Applied Materials Lab., Department of Metallurgical Engineering, Sung Kyun Kwan University;

한국표면공학회지, Vol. 29, No. 5, pp. 545-548.

DOI :

NITROGEN DOPED DIAMOND LIKE CARBON FILM SYNTHESIZED BY MICROWAVE PLASMA CVD

[Urao, Ryoichi;Hayatsu, Osamu;Satoh, Toshihiro;Yokota, Hitoshi;]

Materials Science, School of Engineering, Ibaraki University;Graduate School, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 549-555.

DOI :

OPTICAL PROPERTIES OF AMORPHOUS CN FILMS

[Park, Sung-Jin;Lee, Soon-Il;Oh, Soo-Ghee;Bae, J.H.;Kim, W.M.;Cheong, B.;Kim, S.G.;]

Department of Physics, Ajou University;Division of Metals, Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 556-562.

DOI :

DEGRADATION OF Zn$_3$$N_2$ FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING

[Futsuhara, Masanobu;Yoshioka, Katsuaki;Takai, Osamu;]

Department of Materials Processing Engineering, School of Engineering, Nagoya University, Paint Design Institute, Nippon Paint Co., Ltd.;Paint Design Institute, Nippon Paint Co., Ltd.;Department of Materials Processing Engineering, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 563-569.

DOI :

PROPERTIES OF PIB-CU FILMS ACCELERATION VOLTAGE AND IONIZATION POTENTIAL

[Kim, K.H.;Jang, H.G.;Han, S.;Choi, S.C.;Choi, D.J.;Jung, H.J.;Koh, S.K.;]

Div. of Ceramics, Korea Institute of Science and Technology;Dept. of Ceramic engineering, Yonsei university;

한국표면공학회지, Vol. 29, No. 5, pp. 570-576.

DOI :

EFFECTS OF SUBSTRATE TEMPERATURE ON PROPERTIES OF FLUORINE CONTAINED SILICON OXIDE FILMS PREPARED BY MICROWAVE PLASMA- ENHANCED CVD

[Sugimoto, Nobuhisa;Hozumi, Atsushi;Takai, Osamu;]

Department of Materials Processing Engineering Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 577-584.

DOI :

EFFECTS OF GAS PRESSURES ON GRANULAR STRUCTURE`S FOR MATION OF ALUMINUM FILMS PREPARED BY PVD PROCESS

[Lee, Myeong-hoon;]

Korea Maritime University;

한국표면공학회지, Vol. 29, No. 5, pp. 585-592.

DOI :

DECOMPOSITION OF HIGHER ORGANIC COMPOUND IN AN ATMOSPHERIC PRESSURE NON-EQUILIBRIUM PLASMA

[Kitokawa, Kazutoshi;Itou, Akihito;Sugiyama, Kazuo;]

Department of Applied Chemistry, Faculty of Engineering. Saitama University;

한국표면공학회지, Vol. 29, No. 5, pp. 593-598.

DOI :

EFFECT OF ALUMINIDE-YTTRIUM COMPOSITE COATING ON THE OXIDATION RESISTANCE OF TiAl ALLOY

[Jung, Hwan-Gyo;Kim, Jong-Phil;Kim, Kyoo-Young;]

Pohang University of Science and Technology Center for Advanced Aerospace Materials;

한국표면공학회지, Vol. 29, No. 6, pp. 607-614.

DOI :

FORMATION OF IRON SULFIDE BY PLASMA-NITRIDING USING SUBSIDIARY CATHODE

[Hong, Sung-Pill;Urao, Ryoichi;Takeuchi, Manabu;Kojima, Yoshitaka;]

Graduate School, Ibaraki University;Materials Science, School of Engineering, Ibaraki University;Hitachi Laboratory, Hitachi Ltd. Co.;

한국표면공학회지, Vol. 29, No. 6, pp. 615-620.

DOI :

PREFERRED ORIENTATION AND MICROSTRUCTURE OF MOD DERIVED SrBi$_{2x}$Ta$_2$O$_9$ THIN FILMS WITH Bi CONTENT x

[Yeon, Dae-Joong;Park, Joo-Dong;Oh, Tae-Sung;]

Department of Metallurgy and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 29, No. 6, pp. 621-627.

DOI :

SOFT MAGNETISM OF Co-Zr AND Fe-Co FILMS WITH LARGE SATURATION MAGNETIZATION

[Suemitsu, Katsumi;Nakagawa, Shigeki;Naoe, Masahiko;]

Department of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 628-633.

DOI :

STUDIES ON THE HIGH TEMPERATURE PROPERTIES OF DUPLEX-TREATED AISI H13 STEEL

[Chung, J.W.;Lee, S.Y.;Kim, C.W.;Kim, S.S.;Han, J.G.;Lee, S.Y.;]

Plasma Applied Materials Laboratory, Dept. of Mater. Eng. Hankuk Aviation University;Plasma Applied Materials Laboratory, Dept. of Metall. Eng., Sungkyunkwan University;Mater. Forming Group, Korea Inst. of Mach. and Metals;

한국표면공학회지, Vol. 29, No. 6, pp. 634-639.

DOI :

STUDY OF CATALYSIS FOR MAKING ALCOHOL FROM ACROLEIN AND ISOPROPYL ALCOHO

[Nagase, Yoshinori;]

Department of Materials Science, Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 640-643.

DOI :

IMPROVEMENT OF DISTRIBUTION OF COERCIVITY IN CO-CR FILMS DEPOSSSITED BY FACING TARGETS SPUTTERING

[Takayama, Seiryu;Nakagawa, Shigeki;Kim, Kyung-Hwan;Naoe, Masahiko;]

Dept. of Physical Electronics, Tokyo Institute of Technology;Dept. of Electrical Electronics, Kyung Won University;

한국표면공학회지, Vol. 29, No. 6, pp. 644-647.

DOI :

OPTICAL EMISSION SPECTROSCOPY OF Ch$_4$/Ar/H$_2$ GAS DISCHARGES IN RF PLASMA CVD OF HYDROGENATED AMORPHOUS CARBON FILMS

[Lee, Sung-Soo;Osamu Takai;]

Department of Materials Processing Engineering, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 648-653.

DOI :

SIMULTANEOUS DETERMINATION OF OPTICAL CONSTANTS AND DEPTH-PROFILE OF SPUTTERED AMORPHOUS TiO$_2$ THIN FILMS

[Rhee, Sung-Gyu;Lee, Soon-Il;Oh, Soo-Ghee;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 654-659.

DOI :

OPTICAL PROPERTIES OF INDIUM OXIDE AND INDIUM TIN OXIDE FILMS PREP ARED BY SPUTTERING

[Fujita, Yasuhiko;Kitakizaki, Kaoru;]

Department of Electronic Systems Engineering, Tokyo Metropolitan Institute of Technology;Research Development Headquarters, Meidensha Corporation;

한국표면공학회지, Vol. 29, No. 6, pp. 660-665.

DOI :

EFFECT OF ANNEALING ON THE OPTICAL PROPERTY OF RF-SPUTTERED CdTe THIN FILM

[Lee, Dong-Young;Lee, Soon-Il;Oh, Soo-Ghee;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 666-672.

DOI :

ENHANCEMENT OF PHOTOVOLTAIC PERFORMANCE IN COPPER PHTHALOCYNINE THICK FILM SOLAR CELLS

[Ruiono, Yo Tomota;Momose, Yoshihiro;Takeuchi, Manabu;]

Department of Meterials and Electronic Engineering, Ibaraki University;Department of Electrical and Electronic Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 673-677.

DOI :

PLASMA THIN FILMS PREVENTING CHLORIDE LONS FROM INTERFERING WITH THE NERNSTIAN pH-RESPONSE OF PLATINUM ELECTRODE SURFACE

[Yajima, Tastuhiko;]

Saitama Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 678-682.

DOI :

MO-COMPOUNDS AS A DIFFUSION BARRIER BETWEEN Cu AND Si

[Kim, Ji-Hyung;Lee, Yong-Hyuk;Kwon, Yong-Sung;Yeom, Geun-Young;Song, Jong-Han;]

Department of Materials Engineering, Sungkyunkwan University;Department of Physics, Sungkyunkwan University;Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 683-690.

DOI :

SCRATCH TESTERS ON THE APPLICATION TO THE ADHESION MEASUREMENT OF THIN COATINGS

[Takeshita, Kyo;]

RHESCA Co., Ltd.;

한국표면공학회지, Vol. 29, No. 6, pp. 691-694.

DOI :

THE EFFECT OF SPRAYING PARAMETEES ON THE PROPERTIES OF HYDROXYAPATITE COATUNG

[Park, K.S.;Huh, W.T.;Son, Y.H.;Kim, C.K.;Kim, S.Y.;Kim, S.G.;Kim, S.W.;]

New-Tech Co., Ltd.;Department of Materials Engineering, Yeungnam University;Production Technology Center, KAITECH;

한국표면공학회지, Vol. 29, No. 6, pp. 695-702.

DOI :

AN APPLICATION OF PLASMA-POLYMERIZED YbPc$_2$ FILM: HUMIDITY SENSOR

[Yamana, Masao;Kashiwazaki, Naoya;]

Department of natural sciences, Faculty of Science and Engineering, Tokyo Denki University;Dept. of natural sciences, Faculty of Engineering, Tokyo Denki Univ.;

한국표면공학회지, Vol. 29, No. 6, pp. 703-708.

DOI :

PREPARATION OF ANISOTROPIC CONDUCTIVE FINE PARTICLES BY ELECTROLESS NICKEL PLATING.

[Fujinami, T.;Watanabe, J.;Motizuki, I.;Honma, H.;]

Faculty of Engineering Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 709-713.

DOI :

GOLD WIRE BONDABILITY OF ELECTROLESS GOLD PLATING USING DISULFITEAURATE COMPLEX

[Abe, Shinji;Watanabe, Hideto;Igarashi, Yasushi;Honma, Hideo;]

Fac. of Eng. Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 714-719.

DOI :

FORMATION OF AMORPHOUS NICKEL-PHOSPHORUS ALLOY FILM

[Yamashita, Tsugito;Komiyama, Toyohiko;]

Department of Industrial Chemistry, Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 720-723.

DOI :

PREPARATION OF NICKEL HYDROXIDE FOR NICKEL-CADMIUM CELL

[Sasaki, Yasushi;Yamashita, Tsugito;]

Faculty of Engineering Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 724-727.

DOI :

SURFACE CHARACTERIZATION OF CU ELECTRODES IN ELECTROCHEMICAL REDUCTION OF $CO_2$ BY CORE LEVEL X-RAY PHOTOELECTRON SPECTROSCOPY AND VALENCE LEVEL PHOTOELECTRON EMISSION MEASUREMENT

[Terunuma, Y.;Saitoh, A.;Momose, Y.;]

Department of Materials Science, Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 728-734.

DOI :

ELECTROCHROMIC BEHAVIOR OF AMORPHOUS NICKELPHTHALOCYANINE THIN FILMS

[Masui, Masayoshi;Suzuki, Masato;Kaneko, Fujio;Takeuchi, Manabu;]

Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 735-738.

DOI :

PARAMETER STUDY ON PLASMA-POLYMERIZATION OF LANTHANIDE DIPHTHALOCYANINE FILMS FOR ELECTROCHEMICAL DEVICES

[Kashiwazaki, Naoya;Yamana, Masao;]

Department of natural sciences Faculty of Engineering, Tokyo Denki University;Department of natural sciences, Faculty of Science and Engineering, Tokyo Denki University;

한국표면공학회지, Vol. 29, No. 6, pp. 739-744.

DOI :

WEAR PROPERTY OF PLASMA-SPRAYED COATING LAYERA IN Cr$_2$O$_3$

[Pakr, J.M.;Lee, S.W.;Kim, Byong-Kee;Lee, Dong-Won;]

Department of Materials Engineering, Sun Moon University;Korean Institute of Machery and Materials, Department of Materials Processing;

한국표면공학회지, Vol. 29, No. 6, pp. 745-752.

DOI :

CHARACTERIZATIONS OF TILTED SUPERLATTICE QUANTUM WIRE GROWN BY MIGRATION ENHANCED EPITAXY METHOD

[Kim, D.W.;Woo, J.C.;]

Dept. of Physics, Sun Moon University;Dept. of Physics, Seoul National University;

한국표면공학회지, Vol. 29, No. 6, pp. 753-759.

DOI :

LOW TEMPERATURE DEPOSITION OFSIOx FILMS BY PLASMA-ENHANCED CVD USING 100 kHz GENERATOR

[Kakinoki, Nobuyuki;Suzuki, Takenobu;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 760-765.

DOI :

INVESTIGATIONS OF OXIDATIONS OF SnOx AND ITS CHANGES OF THE PROPERTIES PREPARED BDEPOSITIONY REACTIVE ION-ASSISTED

[Cho, J.S.;Choi, W.K.;Kim, Y.T.;Jung, H.J.;Koh, S.K.;]

Division of Ceramics, Korea Institute and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 766-772.

DOI :

LOW TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS BY UV-ASSOSTED RF PLASMA-ENHANCED CVD

[Hozumi, Atsushi;Sugimoto, Nobuhisa;Sekoguchi, Hiroki;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 773-780.

DOI :

EVALUATION OF WATER REPELLENCY FOR SILICON OXIDE FILMS PREPARED BY RF PLASMA-ENTRANCED CVD

[Sekoguchi, Hiroki;Hozumi, Atsuhi;Kakionoki, Nobuyuki;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 781-787.

DOI :

OBSERV ATION OF MICRO-STRUCTURE AND OPTICAL PROPERTISE OF TITANIUM DIOXIDE THIN FILMS USING OPTICAL MMEHODS

[Kim, S.Y.;Kim, H.J.;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 788-796.

DOI :

DEPOSITION OF A-SIC:H FILMS ON AN UNHEATED SI SUBSTRATE BY LOW FREQUENCY (50Hz) PLASMA Cvd

[Shimozuma, M.;Ibaragi, K.;Yoshion, M.;Date, H.;Yoshida, K.;Tagashira, H.;]

College of Medical Technology, Hokkaido University;Department of Electrical Engineering, Hokkaido University;Hokkaido Polytechnic College;Kitami Institute of Technology;Hokkaido Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 797-802.

DOI :

MATERIAL AND ELECTICAL CHARACTERISTICS OF COPPER FILMS DEPOSITED BY MATAL-ORGANIC CHEMICAL TECHNIQUE

[Cho, Nam-Ihn;Park, Dong-Il;Nam, H. Gin;]

Dept. Electronic Engineering, Sun Moon University;

한국표면공학회지, Vol. 29, No. 6, pp. 803-808.

DOI :

CHARACTERISTICS OF HETEROEPITAXIALLY GROWN $Y_2$O$_3$ FILMS BY r-ICB FOR VLSI

[Choi, S.C.;Cho, M.H.;Whangbo, S.W.;Kim, M.S.;Whang, C.N.;Kang, S.B.;Lee, S.I.;Lee, M.Y.;]

Department of Physics, Yonsei University;Semiconductor Research Center, Samsung Electronics Co., Ltd.;

한국표면공학회지, Vol. 29, No. 6, pp. 809-815.

DOI :

CHARACTERISITCS OF CHLORINE IND DUCTIVELY COUPLED PLASMAS AND THEIR SILICON ETCH PROPERTIES

[Lee, Young-Jun;Kim, Hyeon-Soo;Yeom, Geun-Young;Oho, Kyung-Hee;]

Department of Materials Engineering, Sung Kyun Kwan University;National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 816-823.

DOI :

OPTIMAL SPUTTERING CONDITIONS FOR HIGH-DENSITY MAGNETIC RECORDING MEDIA BY FTS

[Noda, Kohki;Kawanabe, Takashi;Naoe, Masahiko;]

IBM Japan;Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 824-828.

DOI :

COMPOSITION OF SUPERCONDUCTING YBCO THIN FILMS WITH RF REACTIVE SPUTTERING CONDITIONS

[Kim, H.H.;Kim, S.;Shin, S.H.;Park, J.I.;Park, K.J.;]

Department of Electronic Engineering, Doowon Institute of Technology;Inorganic Chemistry Department, National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 829-833.

DOI :

PLASMA DIAGNOSIS OF FANING TARGETS SPUTTERING SYSTEM FOR DEPOSITION OF BA FERRITE FILMS IN Ar, Xe AND $O_2$ GAS MIXTURE

[Matsushita, Nobuhiro;Noma, Kenji;Nakagawa, Shigeki;Naoe, Masahiko;]

Dept. of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 834-838.

DOI :

GROWTH AND ELECTRICAL PROPERTIES OF (La,Sr)CoO$_3$/Pb(Zr,Ti)O$_3$/(La,Sr)CoO$_3$ HETEROSTRUCTURES FOR FIELD EFFECT TRANSISTOR

[Lee, J.;Kim, S.W.;]

Department of Materials Engineering, Sung Kyun Kwan University;

한국표면공학회지, Vol. 29, No. 6, pp. 839-846.

DOI :

EFFECT OF PARAMAGNETIC Co$_{67}$Cr$_{33}$ UNDERLAYER ON CRYSTALLOGRAPHIC AND MAGNETIC CHARACTERISTICS OF Co-Cr-Ta LAYERS IN PERPENDICULAR MAGNETIC RECORDING MEDIA

[Kim, Kyung-Hwan;Nakagawa, Shigeki;Takayama, Seiryu;Naoe, Masahiko;]

Dept. of Electrical Electronics, Kyung Won University;Dept. of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 847-850.

DOI :

STRUCTURAL ANALYSIS OF COPPER PHTHALOCYANINE THIN FILMS FABRICATED BY PLASMA-ACTIVATED EVAPORATION

[Kim, Jun-Tae;Jang, Seong-Soo;Lee, Soon-Chil;Lee, Won-Jong;]

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology;Department of Physics, Korea Advanced Institute of Science and technology;Department of Physics, Korea Adcanced Institute of Science and technology;

한국표면공학회지, Vol. 29, No. 6, pp. 851-856.

DOI :

FABRICATION AND MICROSTRUCTURES OF Al-Li ALLOY PARTICLE-FILMS BY RF-PLASMA TECHNIQUE

[Yoshizawa, Isao;Ono, Tomoko;]

Laboratory of physics, Faculty of Education, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 857-861.

DOI :

EFFECT OF DEPOSITION METHODS ON PHYSICAL PROPERTIES OF POLYCRYSTALLINE CdS

[Lee, Y.H.;Cho, Y.A.;Kwon, Y.S.;Yeom, G.Y.;Shin, S.H.;Park, K.J.;]

Department of Physics, Sung Kyun Kwan University;Department of Materials Engineering, Sung Kyun Kwan University;National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 862-868.

DOI :

ICP ETCHING OF TUNGSTEN FOR X-RAY MASKS

[Jeong, C.;Song, K.;Park, C.;Jeon, Y.;Lee, D.;Ahn, J.;]

Department of Materials Engineering, Hanyang University;LG Electronics Research Center;

한국표면공학회지, Vol. 29, No. 6, pp. 869-875.

DOI :

DOPING EFFICIENCIES OF OXYGEN VACANCY AND SN DONOR FOR ITO AND InO THIN FILMS

[Chihara, Koji;Honda, Shin-ichi;Watamori, Michio;Oura, Kenjiro;]

Department of Electric Engineering, Faculty of Engineering, Osaka University;

한국표면공학회지, Vol. 29, No. 6, pp. 876-879.

DOI :

CHARACTERIXATION OF PLASMA ION IMPLANTED SURFACES USING TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMATRY

[Lee, Yeon-Hee;Han, Seung-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;]

Advanced Analysis Center, Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 880-883.

DOI :

ADSORPTION OF ATOMIC-HYDROGAN ON THE Si(100)-(2$ imes$l)-SB SURFACE STUDIED BY TOF-ICISS/LEED

[Ryu, Jeong-Tak;Kui, Koichiro;Katayama, Mitsuhiro;Oura, Kenjiro;]

Department of Electronic Engineering, Faculty of Engineering, Osaka University;

한국표면공학회지, Vol. 29, No. 6, pp. 884-890.

DOI :